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Materials Chemistry and Physics

Volumn 124, Issue 2-3, 2010, Pages 1146-1150

Influences of arc current on composition and properties of MgO thin films prepared by cathodic vacuum arc deposition

(8) Zhu, Daoyun a,b Zheng, Changxi a Wang, Mingdong a Liu, Yi a Chen, Dihu a He, Zhenhui a Wen, Lishi a Cheung, W Y c

a SUN YAT SEN UNIVERSITY (China)

b GUANGDONG UNIVERSITY OF TECHNOLOGY (China)

c CHINESE UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Arc current; MgO thin films; Vacuum arc deposition

Indexed keywords

ARC CURRENT; ATOMIC RATIO; CATHODIC VACUUM ARCS; DEPOSITION PRESSURES; MGO THIN FILMS; MGO(1 0 0); MGO(1 1 0); OPTICAL TRANSMITTANCE; SECONDARY ELECTRON EMISSION COEFFICIENTS; SEM IMAGE; STOICHIOMETRIC COMPOSITIONS; VACUUM ARC DEPOSITION; XRD PATTERNS;

DEPOSITION; SECONDARY EMISSION; THIN FILMS; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 77957842422 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2010.08.049 Document Type: Article

Times cited : (2)

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