Characteristics of ion beam modified magnesium oxide films

Thin Solid Films

Volumn 447-448, Issue , 2004, Pages 377-382

  Yasui, Nobuto ^a   Nomura, Hiroshi ^a   Ide Ektessabi, Ari ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Atomic force microscopy (AFM); Ion beam surface modification; Magnesium oxide; Plasma display panel; X Ray photoelectron spectroscopy (XPS)

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON CYCLOTRON RESONANCE; ION BEAMS; ION BOMBARDMENT; MORPHOLOGY; PLASMA DISPLAY DEVICES; PROTECTIVE COATINGS; SECONDARY EMISSION; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON EMISSION COEFFICIENTS; ION BEAM SURFACE MODIFICATION; PLASMA DISPLAY PANELS;

MAGNESIA;

EID: 1342302438     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01087-3     Document Type: Conference Paper

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