Nonlinear optical properties of silicon nanoclusters/nanocrystals doped SiO2 films: Annealing temperature dependence

Journal of Applied Physics

Volumn 108, Issue 6, 2010, Pages

  Ito, Masahiko ^a   Imakita, Kenji ^a   Fujii, Minoru ^a   Hayashi, Shinji ^a  

^a KOBE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING TEMPERATURES; COMPREHENSIVE STUDIES; DEFECT STATE; ELECTRON SPIN RESONANCE; HIGH-TEMPERATURE ANNEALING; LARGE N; NON-LINEAR OPTICAL PROPERTIES; NONLINEAR REFRACTIVE INDEX; SI NANOCLUSTER; SI NANOCRYSTAL;

ANNEALING; DEFECTS; ELECTRONIC STATES; LIGHT REFRACTION; NANOCLUSTERS; NANOCRYSTALS; NONLINEAR OPTICS; REFRACTIVE INDEX; REFRACTOMETERS; SILICON COMPOUNDS; SILICON OXIDES; SPIN DYNAMICS;

SILICON;

EID: 77957747992     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3480821     Document Type: Article

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