Modification of the nonlinear optical absorption and optical Kerr response exhibited by nc-Si embedded in a silicon-nitride film

Optics Express

Volumn 17, Issue 12, 2009, Pages 10056-10068

  Lopez Suarez A ^a   Torres Torres, C ^b   Rangel Rojo, R ^c   Reyes Esqueda, J A ^a   Santana, G ^a   Alonso, J C ^a   Ortiz, A ^a   Oliver, A ^a  

^a UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^b INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^c CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTROMAGNETIC WAVE ABSORPTION; LIGHT ABSORPTION; NITRIDES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON NITRIDE; ULTRASHORT PULSES;

NITROGEN ATMOSPHERES; NON-LINEAR REFRACTION; NONLINEAR OPTICAL ABSORPTION; PHOTOLUMINESCENCE SIGNALS; REFRACTIVE NON-LINEARITY; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; SILICON NANOCLUSTERS; SILICON NITRIDE FILM;

NONLINEAR OPTICS;

NANOMATERIAL; SILICON DERIVATIVE; SILICON NITRIDE;

ABSORPTION; ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL MODEL; CHEMISTRY; COMPUTER SIMULATION; LIGHT; NONLINEAR SYSTEM; RADIATION SCATTERING; ULTRASTRUCTURE;

ABSORPTION; COMPUTER SIMULATION; LIGHT; MEMBRANES, ARTIFICIAL; MODELS, CHEMICAL; NANOSTRUCTURES; NONLINEAR DYNAMICS; SCATTERING, RADIATION; SILICON COMPOUNDS;

EID: 66849111729     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.010056     Document Type: Article

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