Thermo-optic effect and optical third order nonlinearity in nc-Si embedded in a silicon-nitride film

Optics Express

Volumn 16, Issue 22, 2008, Pages 18390-18396

  Torres Torres, C ^a   Lopez Suarez A ^b   Tamayo Rivera, L ^c   Rangel Rojo, R ^c   Crespo Sosa, A ^b   Alonso, J C ^b   Oliver, A ^b  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^c CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

NITRIDES; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SILICON NITRIDE;

NON-LINEAR RESPONSE; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; SELF DIFFRACTION; SILICON NANOCLUSTERS; SILICON NITRIDE FILM; THERMAL CONTRIBUTIONS; THERMOOPTIC EFFECTS; THIRD-ORDER NON-LINEARITY;

OPTICAL KERR EFFECT;

EID: 55349088253     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.018390     Document Type: Article

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