Third-order nonlinear optical response of silicon nanostructures dispersed in organic solvent under 1064 nm and 532 nm laser excitations

Optics Communications

Volumn 270, Issue 2, 2007, Pages 391-395

  Cheng, Peihong ^a   Zhu, Huili ^a,b   Bai, Ying ^a   Zhang, Yanke ^a   He, Tingchao ^a   Mo, Yujun ^a  

^a HENAN UNIVERSITY   (China)

^b XIAMEN UNIVERSITY   (China)

Author keywords

Nonlinear absorption; Nonlinear refraction; Si nanostructures

Indexed keywords

ELECTRIC EXCITATION; LASER BEAM EFFECTS; LIGHT ABSORPTION; LIGHT REFLECTION; NONLINEAR OPTICS; ORGANIC SOLVENTS; SILICON;

LASER EXCITATIONS; NONLINEAR ABSORPTION; NONLINEAR OPTICAL RESPONSE; NONLINEAR REFRACTION;

NANOSTRUCTURED MATERIALS;

EID: 33845660420     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optcom.2006.09.050     Document Type: Article

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