The fabrication of submicron hexagonal arrays using multiple-exposure optical interferometry

IEEE Photonics Technology Letters

Volumn 8, Issue 12, 1996, Pages 1662-1664

  Kitson, S C ^a   Barnes, W L ^a   Sambles, J R ^a  

^a UNIVERSITY OF EXETER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; FLUXES; INTERFEROMETRY; LIGHT INTERFERENCE; NONLINEAR OPTICS; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR QUANTUM DOTS;

MULTIPLE EXPOSURE OPTICAL INTERFEROMETRY;

ELECTROOPTICAL DEVICES;

EID: 0030379420     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/68.544711     Document Type: Article

References (9)

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