Nonlinear optical properties of photoresists for projection lithography

Applied Physics Letters

Volumn , Issue , 1995, Pages 455-

  Kewitsch, Anthony S ^a   Yariv, Amnon ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

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[No Author keywords available]

Indexed keywords

EID: 36449000884     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116411     Document Type: Article

References (0)