Growth and characterization of nonpolar a-plane ZnO films on perovskite oxides with thin homointerlayer

Journal of Alloys and Compounds

Volumn 508, Issue 1, 2010, Pages 158-161

  Liang, Yuan Chang ^a  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

Characterization; Oxides; Physical vapor deposition processes

Indexed keywords

A-PLANE; CRYSTALLINE QUALITY; HIGH GROWTH TEMPERATURES; HIGH QUALITY; NON-POLAR; PEROVSKITE OXIDES; PHOTOLUMINESCENCE SPECTRUM; PHYSICAL VAPOR DEPOSITION PROCESSES; RADIO-FREQUENCY-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SRTIO; ULTRA-THIN; UV LIGHT; ZNO; ZNO BUFFER LAYER; ZNO FILMS; ZNO THIN FILM;

ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; CRYSTALLINE MATERIALS; FILM GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; METALLIC FILMS; PEROVSKITE; PHOTOLUMINESCENCE; PHYSICAL VAPOR DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION;

ZINC OXIDE;

EID: 77957338116     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.08.037     Document Type: Article

References (20)

1. Y.C. Liang, C.C. Liu, C.C. Kuo, and Y.C. Liang J. Cryst. Growth 310 2008 3741
2. L. Wang, Y. Pu, W. Fang, J. Dai, Y. Chen, C. Mo, and F. Jiang J. Cryst. Growth 283 2005 87
3. Y.R. Ryu, A. Zhu, J.M. Wrobel, H.M. Jeong, P.F. Miceli, and H.W. White J. Cryst. Growth 216 2000 326
4. Y.C. Liang Electrochem. Solid-State Lett. 12 2009 G54
5. Y.C. Liang, Y.C. Liang, and J.P. Chu Electrochem. Solid-State Lett. 11 2008 G41
6. Y.C. Liang, and Y.C. Liang J. Cryst. Growth 304 2007 275
7. A. Tiwari, C. Jin, D. Kumar, and J. Narayan Appl. Phys. Lett. 83 2003 1773
8. N. Ashkenov, M. Schubert, E. Twerdowski, H.V. Wenckstern, B.N. Mbenkum, H. Hochmuth, M. Lorenz, W. Grill, and M. Grundmann Thin Solid Films 486 2005 153
9. I.W. Kim, and K.M. Lee J. Appl. Phys. 103 2008 073514
10. M. Karger, and M. Schilling Phys. Rev. B 71 2005 075304
11. H.J. Ko, Y.F. Chen, Z. Zhu, T. Hanada, and T. Yao J. Cryst. Growth 208 2000 389
12. J. Han, T.B. Ng, R.M. Biefeld, M.H. Crawford, and D.M. Follstaedt Appl. Phys. Lett. 71 1997 3114
13. X.H. Wei, Y.R. Li, J. Zhu, W. Huang, Y. Zhang, W.B. Luo, and H. Ji Appl. Phys. Lett. 90 2007 151918
14. Y.T. Ho, W.L. Wang, C.Y. Peng, M.H. Liang, J.S. Tian, C.W. Lin, and L. Chang Appl. Phys. Lett. 93 2008 121911
15. M.K. Lee, C.B. Eom, J. Lettieri, I.W. Scrymgeour, D.G. Schlom, W. Tian, X.Q. Pan, P.A. Ryan, and F. Tsui Appl. Phys. Lett. 78 2001 329
16. Y.C. Liang Ceram. Int. 36 2010 1743
17. M. Jung, J. Lee, S. Park, H. Kim, and J. Chang J. Cryst. Growth 283 2005 384
18. S. Bethe, H. Pan, and B.W. Wesseis Appl. Phys. Lett. 52 1988 140
19. A. Sasaki, W. Hara, A. Matsuda, N. Tateda, S. Otaka, S. Akiba, K. Saito, T. Yodo, and M. Yoshimoto Appl. Phys. Lett. 86 2005 231911
20. H.F. Liu, S.J. Chua, G.X. Hu, H. Gong, and N. Xiang J. Appl. Phys. 102 2007 083529