Mobility saturation in tapered edge bottom contact copper phthalocyanine thin film transistors

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 28, Issue 4, 2010, Pages

  Royer, James E ^a   Park, Jeongwon ^b   Colesniuc, Corneliu ^c   Lee, Joon Sung ^b   Gredig, Thomas ^c   Lee, Sangyeob ^a   Jin, Sungho ^b   Schuller, Ivan K ^c   Trogler, William C ^a   Kummela, Andrew C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MONOLAYERS; NITROGEN COMPOUNDS; THIN FILMS;

BILAYER RESISTS; BOTTOM CONTACTS; COPPER PHTHALOCYANINE; LIFT-OFF METHODS; SINGLE-LAYER RESISTS;

THIN FILM TRANSISTORS;

EID: 77957242898     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3464771     Document Type: Conference Paper

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