Thickness dependence of mobility in CuPc thin film on amorphous SiO 2 substrate

Journal of Physics D: Applied Physics

Volumn 40, Issue 18, 2007, Pages 5666-5669

  Gao, J ^a   Xu, J B ^a   Zhu, M ^a   Ke, N ^a   Ma, Dongge ^b  

^a CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^b CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; FILM GROWTH; FILM THICKNESS; SILICON COMPOUNDS; TRANSISTORS;

COPPER PHTHALOCYANINE; ORGANIC FILMS; ORGANIC LAYER THICKNESSES;

THIN FILMS;

EID: 34548394189     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/18/022     Document Type: Article

References (23)

1. Edzer H, Huitema A, Gelinck G H, Bas J, Van Der Putten P H, Kuijk K E, Hart K M, Cantatore E and DeLeeuw D M 2002 Adv. Mater. 14 1201
2. Crone B, Dodabalapu A, Lin Y Y, Filas R W, Bao Z, Laduca A, Sarpeshkar R, Katz H E and Li W 2000 Nature 403 521
3. Bao Z, Lovinger A J and Dodabalapur A 1996 Appl. Phys. Lett. 69 3066
4. Mach P, Rodriguez S J, Nortrup R, Wiltzius P and Rogers J A 2001 Appl. Phys. Lett. 78 3592
5. Kato Y, Iba S, Teremoto R, Sekitani T, Someya T, Kawaguchi H and Sakurai T 2004 Appl. Phys. Lett. 84 3789
6. Shankar K and Jackson T N 2004 Mater. J. Res. 19 2003
7. Dodabalapur A, Torsi L and Katz H E 1995 Science 268 270
8. Granstrom E L and Frisbie C D 1999 J. Phys. Chem. B 103 8842
9. Dinelli F, Murgia M, Levy P, Cavallini M, Biscarini F and Leeuw D M D 2004 Phys. Rev. Lett. 92 116802
10. Kiguchi M, Nakayama M, Fujiwara K, Ueno K, Shimada T and Saiki K 2003 Japan. J. Appl. Phys. 42 L1408
11. Ruiz R, Papadimitratos A, Mayer A C and Malliaras G G 2005 Adv. Mater. 17 1795
12. Law K Y 1993 Chem. Rev. 93 449
13. Zhang J, Wang J, Wang H and Yan D 2004 Appl. Phys. Lett. 84 142
14. Ofuji M, Ishikawa K, Takezoe H, Inaba K and Omote K 2005 Appl. Phys. Lett. 86 062114
15. Yuan J F, Zhang J, Wang J, Yan X J, Yan D and Xu W 2003 Appl. Phys. Lett. 82 3967
16. Hadziioannou G and van Hutten P F (ed) 2000 Semiconducting Polymers, Chemistry, Physics and Engineering (Weinheim: Wiley-VCH)
17. Brieva A C, Jenkins T E, Jones D G, Strössner F, Evans D A and Clark G F 2006 J. Appl. Phys. 99 073504
18. Peisert H, Schwieger T, Auerhammer J M, Knupfer M, Golden M S, Fink J, Bressler P R and Mast M 2001 J. Appl. Phys. 90 466
19. Smith D L 1995 Thin-Film Deposition: Principles and Practice (New York: McGrawHill) chapter 5
20. Ruiz R, Nickle B, Koch N, Feldman L C, Haglund R F, Kahn A and Scoles G 2003 Phys. Rev. B 67 125406
21. Hoshino S, Kamata T and Yase K 2002 J. Appl. Phys. 92 6028
22. Shtein M, Mapel J, Benziger J B and Forrest S R 2002 Appl. Phys. Lett. 81 268
23. Kobayashi S, Nishikawa T, Takenobu T, Mopi S, Shimoda T, Mitani T, Shimotani H, Yoshimoto N, Ogawa S and Iwasa Y 2004 Nature Mater. 3 317