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Journal of Photopolymer Science and Technology

Volumn 23, Issue 1, 2010, Pages 25-32

UV-nanoimprint lithography (NIL) process simulation

(1) Hirai, Yoshihiko a,b

a Osaka Prefecture University (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

Nanoimprint; Process simulation; Resist flow; Shrinkage; UV cure

Indexed keywords

EID: 77957104426 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.25 Document Type: Article

Times cited : (21)

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