Numerical study on bubble trapping in UV nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2866-2868

  Morihara, Daisuke ^a   Nagaoka, Yoshinori ^a,b   Hiroshima, Hiroshi ^b,c   Hirai, Yoshihiko ^a,c  

^a Osaka Prefecture University   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BUBBLE TRAPPING; CONSTANT VELOCITIES; DEFECT MODE; FILLING PROCESS; LOW VISCOSITY; NUMERICAL SIMULATION; NUMERICAL STUDIES; RESIST FLOW; UV NANOIMPRINT LITHOGRAPHY;

COMPUTER SIMULATION; CONTACT ANGLE; SUBSTRATES;

NANOIMPRINT LITHOGRAPHY;

EID: 72849117366     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3264661     Document Type: Conference Paper

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