Electromagnetic characterization of nanoimprint mold inspection

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 130-134

  Deng, Yunfei ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; ELECTROMAGNETIC FIELD EFFECTS; ELECTROMAGNETIC WAVE POLARIZATION; INSPECTION; LEAKAGE CURRENTS; MASKS; NUMERICAL METHODS; OPTICAL MATERIALS; REFRACTIVE INDEX;

NANOIMPRINT MOLD INSPECTION; OPAQUE MOLD MATERIALS; PINHOLE DEFECTS;

NANOTECHNOLOGY;

EID: 0037207698     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1531648     Document Type: Article

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