Numerical feasibility study of the fabrication of subwavelength structure by mask lithography

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 18, Issue 5, 2001, Pages 1093-1100

  Ichikawa, Hiroyuki ^a   Kikuta, Hisao ^b  

^a EHIME UNIVERSITY   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COST EFFECTIVENESS; DIFFRACTIVE OPTICS; ELECTROMAGNETIC WAVE DIFFRACTION; LIGHT PROPAGATION; LITHOGRAPHY; PROBLEM SOLVING;

SUBWAVELENGTH STRUCTURES;

MASKS;

EID: 0038455920     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.18.001093     Document Type: Article

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