Effect of bottom electrode structure on electrical properties of BaTiO 3 thin films fabricated by CSD method

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1380, 2010, Pages 669-673

  Sakamoto, Naonori ^a   Yoshioka, Haruna ^a   Suzuki, Junpei ^a,b   Suzuki, Toshimasa ^a,b   Wakiya, Naoki ^a   Suzuki, Hisao ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b TAIYO YUDEN CO LTD   (Japan)

Author keywords

BaTiO3; Bottom electrode; Ferroelectric; LaNiO3; Thin film

Indexed keywords

BARIUM COMPOUNDS; CRYSTAL MICROSTRUCTURE; CRYSTAL STRUCTURE; ELECTRODES; ELECTRON MICROSCOPY; FABRICATION; FERROELECTRIC FILMS; FERROELECTRIC MATERIALS; FERROELECTRICITY; FILMS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; LEAD; PIEZOELECTRIC MATERIALS; PIEZOELECTRICITY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

BATIO; BOTTOM ELECTRODES; CHEMICAL SOLUTION DEPOSITION METHOD; LANIO3; LAYER NUMBER; PEROVSKITE FILMS; PIEZOELECTRIC PROPERTY; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

THIN FILMS;

EID: 77956897735     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.669     Document Type: Article

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