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Volumn 255, Issue 4, 2008, Pages 1194-1200

Formation of atomic secondary ions in sputtering

Author keywords

Ion formation; Ionization mechanism; Ionization probability; Oxygen effect

Indexed keywords

ATOMS; IONIZATION; OXYGEN; SECONDARY EMISSION;

EID: 56449086931     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.05.252     Document Type: Article
Times cited : (39)

References (55)
  • 1
    • 0003108969 scopus 로고
    • Behrisch R., and Wittmaack K. (Eds), Springer, Berlin
    • Yu M.L. In: Behrisch R., and Wittmaack K. (Eds). Sputtering by Particle Bombardment III (1991), Springer, Berlin 91
    • (1991) Sputtering by Particle Bombardment III , pp. 91
    • Yu, M.L.1
  • 14
    • 56449090721 scopus 로고    scopus 로고
    • B. Weidtmann, A. Duvenbeck, A. Wucher, these proceedings.
    • B. Weidtmann, A. Duvenbeck, A. Wucher, these proceedings.
  • 19
    • 0011855736 scopus 로고
    • Benninghoven A., Nihei Y., Shimizu H., and Werner H.W. (Eds), Wiley & Sons
    • Yu M.L. In: Benninghoven A., Nihei Y., Shimizu H., and Werner H.W. (Eds). Secondary Ion Mass Spectrometry (SIMS IX) (1993), Wiley & Sons 10
    • (1993) Secondary Ion Mass Spectrometry (SIMS IX) , pp. 10
    • Yu, M.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.