Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering

Journal of Materials Science

Volumn 45, Issue 20, 2010, Pages 5528-5533

  Alfonso, J E ^a   Buitrago, J ^a   Torres, J ^a   Marco, J F ^b   Santos, B ^b,c  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^b INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^c UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMNAR GROWTH; COMPLEX SURFACE; CRYSTALLINE STRUCTURE; DEPOSITED FILMS; FABRICATION PARAMETERS; GRAZING ANGLES; HIGH HOMOGENEITY; NBN THIN FILM; NIOBIUM NITRIDE; POWER SUPPLY; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; SEM; SUBSTRATE TEMPERATURE; SURFACE COMPOSITIONS; WAVELENGTH DISPERSIVE SPECTROMETRIES; XPS; XRD;

CRYSTALLIZATION; FABRICATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NIOBIUM; NIOBIUM OXIDE; NITRIDES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; WAVELENGTH DISPERSIVE SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM PREPARATION;

EID: 77956462436     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-010-4612-3     Document Type: Article

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