Crystallographic structure and surface composition of NbNx thin films grown by RF magnetron sputtering

Microelectronics Journal

Volumn 39, Issue 11, 2008, Pages 1327-1328

  Alfonso, J E ^a   Buitrago, J ^a   Torres, J ^a   Santos, B ^b,c   Marco, J F ^b  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^b INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO   (Spain)

^c CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

Author keywords

Sputtering; Thin films; XPS

Indexed keywords

CHROMIUM COMPOUNDS; MAGNETRON SPUTTERING; NIOBIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

CRYSTALLOGRAPHIC STRUCTURE; DEPOSITED FILMS; DIFFERENT SUBSTRATES; RF-MAGNETRON SPUTTERING; SILICON WAFER SUBSTRATES; TARGET POWER;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 54949159369     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2008.01.027     Document Type: Article

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