A post-growth processing methodology to achieve barium strontium titanate thin films with low dielectric loss and high tunability for reconfigurable tunable devices

Journal of Materials Science

Volumn 44, Issue 19, 2009, Pages 5332-5338

  Cole, Melanie W ^a   Podpirka, Adrian ^b   Ramanathan, Shriram ^b  

^a U S ARMY RESEARCH LABORATORY   (United States)

^b HARVARD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED FILMS; ANNEALING EXPERIMENTS; ANNEALING PROCESS; BARIUM STRONTIUM TITANATE THIN FILMS; BST FILM; BST THIN FILMS; DIELECTRIC RESPONSE; HIGH TUNABILITY; LOW DIELECTRIC LOSS; MATERIAL PROPERTY; METALORGANIC SOLUTION DEPOSITIONS; PHOTON IRRADIATION; PROCESS PARAMETERS; RE-CONFIGURABLE; RF-SPUTTERING; STRUCTURAL CHANGE; THERMAL-ANNEALING; TIO; TUNABILITIES; TUNABLE DEVICE;

BARIUM; BARIUM TITANATE; DEPOSITION; DIELECTRIC LOSSES; IRRADIATION; MULTIPHOTON PROCESSES; PHOTONS; STOICHIOMETRY; STRONTIUM; STRONTIUM COMPOUNDS; THIN FILMS;

ANNEALING;

EID: 68949177264     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-009-3538-0     Document Type: Article

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