SCOPUS 정보 검색 플랫폼

Volumn 518, Issue 23, 2010, Pages 6904-6908

Influence of annealing temperature on the structural, mechanical and wetting property of TiO2 films deposited by RF magnetron sputtering

(3) Pradhan, Swati S a Sahoo, Sambita a Pradhan, S K a

a CSIR INSTITUTE OF MINERALS AND MATERIALS TECHNOLOGY (India)

Author keywords

Annealing; Contact angle; Radio frequency magnetron sputtering; Thin films; Titanium dioxide

Indexed keywords

ANATASE PHASE; ANNEALED FILMS; ANNEALING TEMPERATURES; AS-DEPOSITED FILMS; BEFORE AND AFTER; FILM SURFACES; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SILICON SUBSTRATES; TIO; UV-LIGHT IRRADIATION; WATER CONTACT ANGLE; WETTING BEHAVIOR; WETTING PROPERTY;

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CONTACT ANGLE; CRYSTAL ATOMIC STRUCTURE; IRRADIATION; MAGNETRON SPUTTERING; MECHANICAL PROPERTIES; NANOINDENTATION; OXIDES; RADIO; RADIO WAVES; RAMAN SPECTROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TRANSMISSION ELECTRON MICROSCOPY; WETTING;

AMORPHOUS FILMS;

EID: 77956231161 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.07.036 Document Type: Article

Times cited : (43)

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