The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 425-429

  Eufinger, K ^a   Janssen, E N ^a   Poelman, H ^a   Poelman, D ^a   De Gryse, R ^a   Marin, G B ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

d.c. magnetron sputtering; Microstructure; Photocatalysis; TiO2

Indexed keywords

ARGON; DEPOSITION; ETHANOL; HEAT TREATMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHOTOCATALYSIS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ANATASE; ATMOSPHERE SIMULATING AIR; STRUCTURAL DEVELOPMENT;

THIN FILMS;

EID: 33748747952     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.247     Document Type: Article

References (12)

1. Carp O., Huisman C.L., and Reller A. Prog. Solid State Chem. 32 (2004) 33
2. Mills A., and Le Hunt S. J. Photochem. Photobiol., A Chem. 108 (1997) 1
3. Ohno T., Tokieda K., Higashida S., and Matsumara M. Appl. Catal., A Gen. 244 (2003) 383
4. Anpo M., and Takeuchi M. J. Catal. 216 (2003) 505
5. Cullity B.D. Elements of X-ray Diffraction. 2nd edition (1978), Addison-Wesley Publishing Company
6. Swanepoel R. J. Phys. E: Sci. Instrum. 29 (1983) 1214
7. Thornton J.A., and Penfold A.S. In: Vossen J.L., and Kern W. (Eds). Thin Film Processes (1978), Academic Press Chapter II-2
8. Schiller S., Beister G., Schneider S., and Sieber W. Thin Solid Films 72 (1980) 475
9. CRC Handbook of Chemistry and Physics, 82nd edition, CRC Press, Boca Raton (2001-2002).
10. 2 P25.
11. Fernández A., Lassaletta G., Jiménez V.M., Justo A., González-Elipe A.R., Herrmann J.-M., Tahiri H., and Ait-Ichou Y. Appl. Catal., B Environ. 7 (1995) 49
12. Takeda S., Suzuki S., Odaka H., and Hosono H. Thin Solid Films 392 (2001) 338