SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6510-6513

Metal silicide-templated growth of quality Si films for Schottky-diodes

(3) Kim, Joondong a Yi, Junsin b Anderson, Wayne A c

a Korea Institute of Machine and Materials (South Korea)

b Sungkyunkwan University (South Korea)

c State University of New York (United States)

Author keywords

Metal silicide template; Quality Si films; Schottky diodes

Indexed keywords

CRYSTALLINE SI (C-SI); CRYSTALLINITIES; DISILICIDES; GRAIN SIZE; METAL MIGRATIONS; METAL SILICIDE; MORPHOLOGICAL CHANGES; NI DIFFUSION; SCHOTTKY; SCHOTTKY-DIODES; SI FILMS; SILICIDE FORMATION; SILICIDE LAYERS; SILICIDE PHASE; TEMPLATED GROWTH; THIN METALS; TRANSMISSION ELECTRON MICROSCOPE; VOLUME GROWTH;

DIODES; FILM GROWTH; METALS; SILICIDES; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77956064458 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.01.049 Document Type: Conference Paper

Times cited : (8)

References (13)

1
- 18844446933
- J. Kim, and W.A. Anderson Thin Solid Films 483 2005 60
- (2005) Thin Solid Films , vol.483 , pp. 60
- Kim, J.¹ Anderson, W.A.²

2
- 33746908523
- J. Kim, and W.A. Anderson Nano Lett. 6 2006 1356
- (2006) Nano Lett. , vol.6 , pp. 1356
- Kim, J.¹ Anderson, W.A.²

3
- 34547357593
- J. Kim, D.-H. Shin, E.-S. Lee, C.-S. Han, and Y.C. Park Appl. Phys. Lett. 90 2007 253103
- (2007) Appl. Phys. Lett. , vol.90 , pp. 253103
- Kim, J.¹ Shin, D.-H.² Lee, E.-S.³ Han, C.-S.⁴ Park, Y.C.⁵

4
- 4344689084
- Y.-G. Yoon, B.-D. Kim, M.-S. Kim, S.-H. Choi, and S.-K. Joo J. Electro. Chem. Soc. 7 2004 G151
- (2004) J. Electro. Chem. Soc. , vol.7 , pp. 151
- Yoon, Y.-G.¹ Kim, B.-D.² Kim, M.-S.³ Choi, S.-H.⁴ Joo, S.-K.⁵

5
- 0037207714
- G.B. Kim, D.-J. Yoo, H.K. Baik, J.-M. Myoung, S.M. Lee, S.H. Oh, and C.G. Park J.Vac. Sci.Technol. B 21 2003 319
- (2003) J.Vac. Sci.Technol. B , vol.21 , pp. 319
- Kim, G.B.¹ Yoo, D.-J.² Baik, H.K.³ Myoung, J.-M.⁴ Lee, S.M.⁵ Oh, S.H.⁶ Park, C.G.⁷

6
- 0037443168
- A. Benatmane, P.C. Montgomery, E. Fogarassy, and D. Zahorski Appl. Phys. Sci. 208 2003 189
- (2003) Appl. Phys. Sci. , vol.208 , pp. 189
- Benatmane, A.¹ Montgomery, P.C.² Fogarassy, E.³ Zahorski, D.⁴

7
- 0000465824
- A. Shih, C.-Y. Meng, S.-C. Lee, and M.-Y. Chern J. Appl. Phys. 88 2000 3725
- (2000) J. Appl. Phys. , vol.88 , pp. 3725
- Shih, A.¹ Meng, C.-Y.² Lee, S.-C.³ Chern, M.-Y.⁴

8
- 0037416535
- J.H. Choi, D.Y. Kim, S.J. Park, B.K. Choo, and J. Jang Thin Solid Films 427 2003 289
- (2003) Thin Solid Films , vol.427 , pp. 289
- Choi, J.H.¹ Kim, D.Y.² Park, S.J.³ Choo, B.K.⁴ Jang, J.⁵

9
- 0141952860
- Y.-G. Yoon, M.-S. Kim, G.-B. Kim, and S.-K. Joo IEEE Electron Device Lett. 24 2003 649
- (2003) IEEE Electron Device Lett. , vol.24 , pp. 649
- Yoon, Y.-G.¹ Kim, M.-S.² Kim, G.-B.³ Joo, S.-K.⁴

10
- 33645501427
- M.-S. Kim, J.-S. Lee, Y.-S. Kim, S.-K. Kim, and S.-K. Joo Electrochem. Solid-State Lett. 9 2006 G56
- (2006) Electrochem. Solid-State Lett. , vol.9 , pp. 56
- Kim, M.-S.¹ Lee, J.-S.² Kim, Y.-S.³ Kim, S.-K.⁴ Joo, S.-K.⁵

11
- 0001008624
- D. Mangelinck, P. Gas, J.M. Gay, B. Pichaud, and O. Thomas J. Appl. Phys. 84 1998 2583
- (1998) J. Appl. Phys. , vol.84 , pp. 2583
- Mangelinck, D.¹ Gas, P.² Gay, J.M.³ Pichaud, B.⁴ Thomas, O.⁵

12
- 0037250142
- A.R. Joshi, T. Krishnamohan, and K.C. Saraswat J. Appl. Phys. 93 2003 175
- (2003) J. Appl. Phys. , vol.93 , pp. 175
- Joshi, A.R.¹ Krishnamohan, T.² Saraswat, K.C.³

13
- 0004005306
- John Wiley & Sons New York
- S.M. Sze Physics of Semiconductor Devices 1981 John Wiley & Sons New York
- (1981) Physics of Semiconductor Devices
- Sze, S.M.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.