Interference microscopy for nanometric surface microstructure analysis in excimer laser processing of silicon for flat panel displays

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 189-193

  Benatmane, A ^a   Montgomery, P C ^a   Fogarassy, E ^a   Zahorski, D ^b  

^a CNRS   (France)

^b SOPRA   (France)

Author keywords

Excimer laser annealing; Interference microscopy; Polysilicon; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; EXCIMER LASERS; FLAT PANEL DISPLAYS; LASER BEAM EFFECTS; MORPHOLOGY; NANOTECHNOLOGY; POLYSILICON; THIN FILM TRANSISTORS; CRYSTALLIZATION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE STRUCTURE;

EXCIMER LASER ANNEALING; NANOMETRIC SURFACES;

SURFACE STRUCTURE; AMORPHOUS SILICON;

EID: 0037443168     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01367-3     Document Type: Conference Paper

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