Ultra low dielectric constant polysilsesquioxane films using T 8(Me4NO)8 as porogen

Thin Solid Films

Volumn 518, Issue 17, 2010, Pages 4768-4772

  Xi, Kai ^a   He, Hui ^a   Xu, Dan ^a   Ge, Renjie ^a   Meng, Zhen ^a   Jia, Xudong ^a   Yu, Xuehai ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

Atomic force microscopy; Double effective porogen; Polyhedral oligomeric silsesquioxanes; Polymethylsilsesquioxane; Thermogravimetry; Ultra low dielectric constant

Indexed keywords

POLYHEDRAL OLIGOMERIC SILSESQUIOXANES; POLYMETHYLSILSESQUIOXANE; POROGENS; THERMOGRAVIMETRY; ULTRA-LOW DIELECTRIC CONSTANT;

ATOMIC FORCE MICROSCOPY; COATINGS; PERMITTIVITY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; THERMOGRAVIMETRIC ANALYSIS;

FILM PREPARATION;

EID: 77955655251     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.020     Document Type: Article

References (26)

1. The International Technology Roadmap for Semiconductors 1999 Semiconductor Industry Association San Jose, CA
2. R.D. Miller Science 286 1999 421
3. G. Maier Prog. Polym. Sci. 26 2001 3
4. A. Alex, B.V. Vjoseph, and W.W. Gerberich Thin Solid Films 429 2003 201
5. L. Shen, and K.Y. Zeng Microelectron. Eng. 71 2004 221
6. T.M. Long, and T.M. Swager J. Am. Chem. Soc. 125 2003 14113
7. B. Lee, Y.H. Park, Y.T. Hwang, W. Oh, J. Yoon, and M. Ree Nat. Mater. 4 2005 147
8. Z.B. Wang, H.T. Wang, A. Mitra, L.M. Huang, and Y.S. Yan Adv. Mater. 13 2001 746
9. Z.B. Wang, A. Mitra, H.T. Wang, L.M. Huang, and Y.S. Yan Adv. Mater. 13 2001 1463
10. S. Li, J.N. Sun, Z.J. Li, H.G. Peng, D. Gidley, E.T. Ryan, and Y.S. Yan J. Phys. Chem. B 108 2004 11689
11. T.C. Chang, T.M. Tsai, P.T. Liu, C.W. Chen, S.T. Yan, H. Aoki, Y.C. Chang, and T.Y. Tseng Thin Solid Films 447 2004 524
12. R.H. Baney, M. Itoh, A. Sakakibara, and T. Suzukit Chem. Rev. 95 1995 1409
13. S. Li, Z.J. Li, and Y.S. Yan Adv. Mater. 15 2003 1528
14. R.Q. Su, T.E. Muller, J. Prochazka, and J.A. Lercher Adv. Mater. Des. 14 2002 1369
15. C.M. Leu, Y.T. Chang, and K.H. Wei Macromolecules 36 2003 9122
16. M.E. Wright, D.A. Schorzman, F.J. Feher, and R.Z. Jin Chem. Mater. 15 2003 264
17. W.J. Lin, W.C. Chen, W.C. Wu, Y.H. Niu, and A.K.Y. Jen Macromolecules 37 2004 2335
18. A.J. Waddon, L. Zheng, R.J. Farris, and E.B. Couglin Nano Lett. 2 2002 1149
19. E.S. Baker, J. Gidden, S.E. Anderson, T.S. Haddad, and M.T. Bowers Nano Lett. 4 2004 779
20. A.C. Reber, P.A. Clayborne, J.U. Reveles, S.N. Khanna, A.W. Castleman Jr., and A. Ali Nano Letters 6 2006 1190
21. E. Barea, X. Batlle, P. Bourges, A. Corma, V. Fornes, A. Labarta, and V.F. Puntes J. Am. Chem. Soc. 127 2005 18026
22. T. Kudo, K. Machida, and M.S. Gordon J. Phys. Chem. A. 109 2005 5424
23. M. Sukharev, and T. Seideman Nano Lett. 6 2006 715
24. K.U. Gore, A. Abraham, S.G. Hegde, R. Kumar, J.P. Amoureux, and S. Ganapathy J. Phys. Chem. B 106 2002 6115
25. H. Xu, B. Yang, J. Wang, S. Guang, and C. Li Macromolecules 38 2005 10455
26. W.E.E. Stone, G.M.S.E. Shafei, J. Sanz, and S.A. Selim J. Phys. Chem. 97 1993 10127