Ultra-low-k pure-silica zeolite MFI films using cyclodextrin as porogen

Advanced Materials

Volumn 15, Issue 18, 2003, Pages 1528-1531

  Li, Shuang ^a   Li, Zijian ^a   Yan, Yushan ^a  

^a University of California Riverside   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ATOMIC FORCE MICROSCOPY; HYDROGEN BONDS; OLIGOMERS; PERMITTIVITY; PORE SIZE; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON WAFERS; SOLUBILITY; SURFACE ROUGHNESS; ZEOLITES;

ACTIVATED HYDROXYL GROUPS; CONTINUOUS STIFFNESS MEASUREMENT TECHNIQUE; CYCLODEXTRIN; DIELECTRIC CONSTANT MEASUREMENT; HYDROPHOBIC CAVITY; NANOPOROUS ORGANOSILICATE MATERIALS; POROGEN; THERMAL EVAPORATION;

NANOSTRUCTURED MATERIALS;

EID: 0141508951     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200305173     Document Type: Article

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