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Volumn 518, Issue 20, 2010, Pages 5762-5768

Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering

Author keywords

Coatings; Hardness; Scanning electron microscopy; Sputtering; Surface morphology; X ray diffraction

Indexed keywords

304 STAINLESS STEEL; CHROMIUM NITRIDE; DIRECT-CURRENT; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MAXIMUM HARDNESS; MICROHARDNESS TESTS; MICROSTRUCTURAL CHARACTERISTICS; NITROGEN CONTENT; PREFERRED ORIENTATIONS; PROCESS CONDITION; REACTIVE MAGNETRON SPUTTERING; SPUTTERING GAS; SPUTTERING PARAMETERS; STEEL SUBSTRATE; SUBSTRATE TEMPERATURE;

EID: 77955426185     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.095     Document Type: Conference Paper
Times cited : (51)

References (33)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.