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Volumn 518, Issue 20, 2010, Pages 5762-5768
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Influence of sputtering parameters and nitrogen on the microstructure of chromium nitride thin films deposited on steel substrate by direct-current reactive magnetron sputtering
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Author keywords
Coatings; Hardness; Scanning electron microscopy; Sputtering; Surface morphology; X ray diffraction
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Indexed keywords
304 STAINLESS STEEL;
CHROMIUM NITRIDE;
DIRECT-CURRENT;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
MAXIMUM HARDNESS;
MICROHARDNESS TESTS;
MICROSTRUCTURAL CHARACTERISTICS;
NITROGEN CONTENT;
PREFERRED ORIENTATIONS;
PROCESS CONDITION;
REACTIVE MAGNETRON SPUTTERING;
SPUTTERING GAS;
SPUTTERING PARAMETERS;
STEEL SUBSTRATE;
SUBSTRATE TEMPERATURE;
ATOMIC FORCE MICROSCOPY;
CHROMIUM;
COATINGS;
FIELD EMISSION;
FIELD EMISSION MICROSCOPES;
HARDNESS;
NITRIDES;
NITROGEN;
SCANNING;
SCANNING ELECTRON MICROSCOPY;
STAINLESS STEEL;
SUBSTRATES;
SURFACE TOPOGRAPHY;
THIN FILMS;
TOPOGRAPHY;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
SURFACE MORPHOLOGY;
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EID: 77955426185
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.05.095 Document Type: Conference Paper |
Times cited : (51)
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References (33)
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