Synthesis and photo-induced deprotection reaction of noria derivatives containing acetal moieties

Kobunshi Ronbunshu

Volumn 66, Issue 1, 2009, Pages 10-16

  Kudo, Hiroto ^a   Watanabe, Daisuke ^a   Nishikubo, Tadatomi ^a  

^a KANAGAWA UNIVERSITY   (Japan)

Author keywords

Acetal; Noria; Photo induced deprotection

Indexed keywords

ACIDS; ELECTRON BEAMS; ULTRAVIOLET DEVICES;

ACETAL; ACETAL GROUPS; CARBOXYL ACIDS; DE-PROTECTION REACTIONS; EXTREME ULTRA VIOLETS; FILM STATE; HIGH RESOLUTIONS; HYDROXYL GROUPS; NORIA; PHOTO-ACID GENERATORS; PHOTO-INDUCED DEPROTECTION; RESIST MATERIALS; RESIST SYSTEMS; THERMAL STABILITIES; UV IRRADIATIONS;

DERIVATIVES;

HEATING; PHYSICAL PROPERTY; SYNTHESIS; THERMAL STABILITY;

EID: 60849127581     PISSN: 03862186     EISSN: None     Source Type: Journal    
DOI: 10.1295/koron.66.10     Document Type: Article

References (24)

1. For example: Reviews: A. M. Goethals, G. Vandenberghe, I. Pollentier, M. Ercken, P. De. Bisschop, M. Maenhoudt, and K. Ronse, J. Photopolym. Sci. Technol., 14, 333 (2001).
2. For example: Reviews: H. Ito, J. Polym. Sci., Part A: Polym. Chem., 41, 3863 (2003).
3. S. A. MacDonald, C. G. Willson, and J. M. J. Frechet, Acc. Chem. Res., 27, 151 (1994).
4. C. G. Willson, B. C. Trinque, B. P. Osborn, C. Chambers, R. Y. Hedieh, T. Chiba, P. Zimmerma, D. Miller, and W. Conley, J. Pholopolym. Sci. Technol., 15, 583 (2002).
5. C. K. Ober, K. Douki, V. R. Vohra, Y. Kwark, X. Liu, W. Conley, D. Miller, and P. Zimmerman, J. Photopolym. Sci., Technol., 15, 603 (2002).
6. H. Ito, G. M. Wallraff, N. Fender, P. J. Brock, C. E. Larson, H. D. Truong, G. Breyta, D. Miller, M. Sherwood, and R. D. Allen, J. Photopolym. Sci. Technol., 15, 693 (2002).
7. Z. M. Fresco, N. Bensel, I. Suez, S. A. Backer, and J. M. J. Frechet, J. Photopolym. Sci. Technol., 16, 27 (2003).
8. D. C. Tully, A. R. Trimble, and J. M. J. Frechet Adv. Mater., 12, 1118 (2000).
9. J. Dai, S. W. Chang, A. Hamad, D. Yang, N. Felix, and C. K. Ober, Chem. Mater., 18, 3404 (2006).
10. T. Hirayama, D. Shiono, S. Matsumaru, T. Ogata, H. Hada, J. Onodera, T. Arai, T. Sakamizu, A. Yamaguchi, H. Shiraishi, H. Fukuda, and M. Ueda, J. Appl. Phys., 44, 5484 (2005).
11. T. Kadota, H. Kageyama, F. Wakaya, K. Gamo, and Y. Shirota, Chem. Lett., 3, 706 (2004).
12. J. Fujita, Y. Onishi, Y. Ochiai, and S. Matsui, Appl. Phys. Lett., 68, 1297 (1996).
13. Y. Ochiai, S. Manako, H. Yamamoto, T. Teshima, J. Fujita, and E. J. Nomura, J. Pholopolym. Sci. Technol., 13, 413 (2000).
14. For example: C. D. Gutsche, "Calixarenes", Royal Society of Chemistry, Cambridge (1989).
15. T. Nishikubo, A. Kameyama, K. Tsutsui, and M. Iyo, J. Polym. Sci., Part A: Polym. Chem., 37, 1805 (1999).
16. M. Iyo, K. Tsutsui, A. Kameyama, and T. Nishikubo, J. Polym. Sci., Part A: Polym. Chem., 37, 3071 (1999).
17. T. Nishikubo, A. Kameyama, and K. Tsutsui, J. Polym. Sci., Part A: Polym. Chem., 39, 1169 (2001).
18. T. Nishikubo, A. Kameyama, H. Kudo, and K. Tsutsui, J. Polym. Sci., Part A: Polym. Chem., 40, 1293 (2002).
19. H. Kudo, K. Mitani, T. Nishikubo, M. Masaya, and T. Miyashita, Bull. Chem. Soc. Jpn., 77, 819 (2004).
20. H. Kudo, K. Mitani, S. Koyama, and T. Nishikubo, Bull. Chem. Soc. Jpn., 77, 2109 (2004).
21. Japanese source.
22. H. Kudo, R. Hayashi, K. Mitani, T. Yokozawa, N. C. Kasuga, and T. Nishikubo, Angew. Chem., Int. Ed., 45, 7948 (2006).
23. X. André, J. K. Lee, A. DeSilva, C. K. Ober, H. B. Cao, H. Deng, H. Kudo, D. Watanabe, and T. Nishikubo, SPIE, 6519, 65194B (2007).
24. H. Kudo, D. Watanabe, T. Nishikubo, and C. K. Ober, J. Mater. Chem., in press.