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Volumn , Issue , 2010, Pages 858-863

Cu/Sn microbumps interconnect for 3D TSV chip stacking

Author keywords

[No Author keywords available]

Indexed keywords

3-D INTEGRATION; BONDING INTERFACES; BONDING PROCESS; CHIP STACKING; CLEANING AGENTS; CU-SN INTERMETALLICS; DIE STACKING; FUTURE GENERATIONS; INTEGRATION SCHEME; LOW TEMPERATURES; MICRO-BUMPS; PICK AND PLACE; SOLID METALS; TRANSIENT LIQUID PHASE BONDING;

EID: 77955205027     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ECTC.2010.5490698     Document Type: Conference Paper
Times cited : (108)

References (9)
  • 1
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    • Study of the Au/In reaction for Transient liquid-phase bonding and 3D chip stacking
    • W. Zhang, W. Ruythooren, "Study of the Au/In reaction for Transient liquid-phase bonding and 3D chip stacking," Journal of Electronic Material, vol.37, no.8, 2008, pp. 1095-1101.
    • (2008) Journal of Electronic Material , vol.37 , Issue.8 , pp. 1095-1101
    • Zhang, W.1    Ruythooren, W.2
  • 2
    • 34547375250 scopus 로고    scopus 로고
    • 3D stacking technology with low volume lead free interconnections
    • K. Sakuma, P.S. Andry, B. Dang, et al., "3D stacking technology with low volume lead free interconnections," Proc. of ECTC 2007, pp. 627-632.
    • Proc. of ECTC 2007 , pp. 627-632
    • Sakuma, K.1    Andry, P.S.2    Dang, B.3
  • 4
    • 70349666744 scopus 로고    scopus 로고
    • High density Cu-Sn TLP bonding for 3D integration
    • R. Agarwal, W. Zhang, P. Limaye, W. Ruythooren, "High Density Cu-Sn TLP Bonding for 3D Integration," pp. 345-349, 59th ECTC, 2009.
    • (2009) 59th ECTC , pp. 345-349
    • Agarwal, R.1    Zhang, W.2    Limaye, P.3    Ruythooren, W.4
  • 5
    • 19944432174 scopus 로고    scopus 로고
    • Kirkendall void formation in eutectic SnPb solder joints on bare Cu and its effect on joint reliability
    • K Zeng, R Stierman, TC Chiu and D Edwards, "Kirkendall void formation in eutectic SnPb solder joints on bare Cu and its effect on joint reliability," JAP (2005); Vol 97, 024508.
    • (2005) JAP , vol.97 , pp. 024508
    • Zeng, K.1    Stierman, R.2    Chiu, T.C.3    Edwards, D.4
  • 6
    • 40549103469 scopus 로고    scopus 로고
    • Effects of residual impurities in electroplated Cu on the Kirkendall void formation during soldering
    • J.Y. Kim and J. Yu, "Effects of residual impurities in electroplated Cu on the Kirkendall void formation during soldering," Applied Physics Letters (2008); Vol 92, 092109.
    • (2008) Applied Physics Letters , vol.92 , pp. 092109
    • Kim, J.Y.1    Yu, J.2
  • 7
    • 77955196487 scopus 로고    scopus 로고
    • Wafer-level 3-D ICs process technology
    • chapter 7: Cu/Sn solid-liquid interdiffusion bonding
    • A Munding, H Hubner, A Kaiser, S. Penka and E. Kohn, "Wafer-level 3-D ICs process technology," chapter 7: Cu/Sn solid-liquid interdiffusion bonding, Springer Science 2008.
    • (2008) Springer Science
    • Munding, A.1    Hubner, H.2    Kaiser, A.3    Penka, S.4    Kohn, E.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.