Silicon nanotips formed by self-assembled Au nanoparticle mask

Journal of Nanoparticle Research

Volumn 12, Issue 5, 2010, Pages 1821-1828

  Wang, Ying ^a   Zhu, Linpei ^a   Zhang, Yafei ^a   Yang, Minglai ^b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b SHANGHAI UNIVERSITY OF ENGINEERING SCIENCE   (China)

Author keywords

Au nanoparticle; Nanolithography; Nanoscale patterning; Reactive ion etching; Self assembly; Silicon nanotip

Indexed keywords

3-AMINOPROPYLTRIMETHOXYSILANE; 3-MERCAPTOPROPYLTRIMETHOXYSILANE; AU NANOPARTICLE; COLLOIDAL PARTICLE; ETCH MASK; ETCHING CONDITION; HIGH DENSITY; NANOSCALE PATTERNING; ORDERED ARRAY; SELF-ASSEMBLED; SELF-ASSEMBLY TECHNOLOGY; SI NANOSTRUCTURES; SI SUBSTRATES; SI SURFACES; SILICON NANOTIPS; THIN FILM MATERIAL;

FUNCTIONAL GROUPS; GOLD; IONS; MONOLAYERS; NANOLITHOGRAPHY; NANOPARTICLES; NANOSTRUCTURED MATERIALS; NANOTIPS; SELF ASSEMBLY; SILICON; SUBSTRATES;

REACTIVE ION ETCHING;

3 AMINOPROPYLTRIMETHOXYSILANE; 3 MERCAPTOPROPYLTRIMETHOXYSILANE; FUNCTIONAL GROUP; GOLD NANOPARTICLE; SELF ASSEMBLED MONOLAYER; SILANE DERIVATIVE; SILICON; UNCLASSIFIED DRUG;

ARTICLE; COLLOID; DENSITY; FILM; HEAT TREATMENT; PARTICLE SIZE; PRIORITY JOURNAL; SURFACE PROPERTY; TECHNOLOGY;

EID: 77955087264     PISSN: 13880764     EISSN: 1572896X     Source Type: Journal    
DOI: 10.1007/s11051-009-9741-8     Document Type: Article

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