Two-phase nanostructured carbon nitride films prepared by direct current magnetron sputtering and thermal annealing

Surface and Coatings Technology

Volumn 205, Issue 1, 2010, Pages 152-157

  Liu, D G ^a   Tu, J P ^a   Hong, C F ^a   Gu, C D ^a   Mao, S X ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b University of Pittsburgh   (United States)

Author keywords

Carbon nitride; Hardness; Nanocrystalline; Thermal annealing; Two phase

Indexed keywords

CARBON NITRIDE FILMS; CRYSTALLINE PHASE; CRYSTALLINE PHASIS; DIRECT CURRENT MAGNETRON SPUTTERING; FRACTIONAL CONCENTRATION; HIGH HARDNESS; LATTICE PARAMETERS; NANOCRYSTALLINE GRAINS; NANOCRYSTALLINES; NANOSTRUCTURED CARBONS; RAMAN SPECTRA; SI SUBSTRATES; TEM; THERMAL-ANNEALING;

ANNEALING; CARBON NITRIDE; CRYSTALLINE MATERIALS; FILM PREPARATION; HARDNESS; LATTICE CONSTANTS; MECHANICAL PROPERTIES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON FILMS;

EID: 77954956173     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.06.022     Document Type: Article

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