Crystalline β-C3N4 films deposited on metallic substrates by microwave plasma chemical vapor deposition

Materials Science and Engineering: A

Volumn 271, Issue 1-2, 1999, Pages 206-212

  Gu, Y S ^a   Zhang, Y P ^a   Duan, Z J ^a   Chang, X R ^a   Tian, Z Z ^a   Shi, D X ^b   Ma, L P ^b   Zhang, X F ^b   Yuan, L ^b  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

Carbon nitride; Metallic substrates; MPCVD; C3N4

Indexed keywords

EID: 0012475019     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(99)00212-9     Document Type: Article

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