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Volumn 48, Issue 7-9, 1997, Pages 681-684

Reactive ion etching of ion-plated carbon films

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; MASKS; PHOTORESISTS; REACTIVE ION ETCHING; SPUTTER DEPOSITION;

EID: 0031220060     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00068-7     Document Type: Article
Times cited : (5)

References (13)
  • 2
    • 0003437440 scopus 로고
    • ed. A. Michette, G. Morrison and C. Buckley. Springer-Verlag, Berlin
    • Charalambous, P. and Morris, D., in X-Ray Microscopy III, ed. A. Michette, G. Morrison and C. Buckley. Springer-Verlag, Berlin, 1992, pp. 79-86.
    • (1992) X-Ray Microscopy III , pp. 79-86
    • Charalambous, P.1    Morris, D.2
  • 6
    • 0001670005 scopus 로고
    • IPCS No 148
    • Yi, H., Ivanov, Z., Winkler, D., Zhang, Y., Olin, H., Larsson, P. and Claeson, T., Appl. Phys. Lett., 1994, 65, 1177; Larsson, P., Nilsson, B., Yi H. R. and Ivanov, Z. G., IPCS No 148. Proc. EUCAS'95, 1995, 2, 935.
    • (1995) Proc. EUCAS'95 , vol.2 , pp. 935
    • Larsson, P.1    Nilsson, B.2    Yi, H.R.3    Ivanov, Z.G.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.