Preserving the mask integrity for the lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7748, Issue , 2010, Pages

  Singh, Sherjang ^a   Dress, Peter ^a,b   Dietze, Uwe ^a  

^a HamaTech USA Inc   (United States)

^b HamaTech APE ^*  (Germany)

Author keywords

193 immersion technology; CD uniformity control; Doublepatterning; Haze; Mask cleaning; Photolysis; Resist stripping; VUV ozone process

Indexed keywords

CD UNIFORMITY; DOUBLEPATTERNING; IMMERSION TECHNOLOGY; MASK CLEANING; RESIST STRIPPING;

DATA STORAGE EQUIPMENT; OPTICAL PROPERTIES; OZONE; OZONE LAYER; PHOTOLYSIS; PHOTOMASKS; STRIPPING (DYES); SURFACE CLEANING; TECHNOLOGY;

LITHOGRAPHY;

EID: 77954413568     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.865881     Document Type: Conference Paper

References (15)

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