Haze prevention and phase/transmission preservation through cleaning process optimization

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 1, 2005, Pages

  Qin, Jennifer ^a   Zhang, Yuan ^a   Delgado, Rob ^a   Rockwell, Barry ^a   Tan, Florence ^b   Phan, Khoi ^c   Berger, Lothar ^d   Liu, Min ^e   Dietez, Uwe ^e  

^a PHOTRONICS INC   (United States)

^b Spansion SDC ^*  (United States)

^c Submicron Development Center   (United States)

^d STEAG AG   (Germany)

^e Steag Hamatech USA   (United States)

Author keywords

Haze; Ion chromatography; Mask cleaning; Phase; Transmission

Indexed keywords

CHROMATOGRAPHIC ANALYSIS; ELECTRIC LAMPS; LIGHT TRANSMISSION; MASKS; ULTRAVIOLET DEVICES;

HAZE; ION CHROMATOGRAPHY; MASK CLEANING; PHASE; TRANSMISSION;

CLEANING;

EID: 33644594893     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633170     Document Type: Conference Paper

References (5)

1. Y. D. Kim, D. B. Kang and Y. Zhang et al, "The effect of polarized 193nm irradiation on photomask haze formation", Proceeding of SPIE Microlithography Conference, 5754-175, 2005.
2. C. Chovino, S. Helbig, P. Haschke, W. Saule, "Investigation of sulfate-free clean processes for next generation lithography", SPIE Proc., to be published at Bacus, 2005
3. H. Koster, K. Branz, U. Dietze, P. Dress, G. Hess, "Novell acid-free cleaning process for mask blanks", SPIE Proc., Photomask Japan, 2005
4. F. O. Eschbach, D. Tanzil, M. Kovalchick, U. Dietze, M. Liu, F. Xu, "Improving photomask surface properties through a combination of dry and wet cleaning steps", SPIE Proc. Vol. 5446, p. 209, Photomask Japan 2004
5. K. Bhattacharyya, W. Volk, B. Grenon, D. Brown, J. Ayala, "Investigation of reticle defect formation at DUV lithography", SPIE Proc. Vol. 4889, p. 478-487, Bacus 2002