Pattern decomposition for double patterning from photomask viewpoint

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Toyama, Nobuhito ^a   Adachi, Takashi ^a   Inazuki, Yuichi ^a   Sutou, Takanori ^a   Morikawa, Yasutaka ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Decomposition; Double patterning; Error; Photomask

Indexed keywords

ERROR DETECTION; FABRICATION; LITHOGRAPHY; LOGIC PROGRAMMING; PHOTOMASKS; SPECIFICATIONS;

DECOMPOSED PHOTOMASKS; DOUBLE PATTERNING; IMMERSION; PHOTOMASK FABRICATION;

PATTERN RECOGNITION;

EID: 35148859308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711915     Document Type: Conference Paper

References (4)

1. itrs2006 : public.itrs.net or etc.
2. C.M. Lim, et al, "Positive and Negative Tone Double Patterning Lithography For 50nm Flash Memory", Proc. of SPIE, Vol.6154 (2006)
3. J. Park, et al, "Application Challenges with Double Patterning Technology (DPT) beyond 45nm", Proc. of SPIE, Vol.6349 (2006)
4. T. Adachi, et al, "45-32nm node photomask technology with water immersion lithography", Proc. of SPIE, Vol. 6349 (2006)