Experimental test results of pattern placement metrology on photomasks with laser illumination source designed to address Double Patterning Lithography challenges

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Roeth, Klaus Dieter ^a   Laske, Frank ^a   Heiden, Michael ^a   Adam, Dieter ^a   Parisoli, Lidia ^a   Czerkas, Slawomir ^a   Whittey, John ^a   Schmidt, Karl Heinrich ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

Advanced reticles; Double Patterning Lithography; In die registration measurement; LMS IPRO4; Mask metrology; Registration metrology; Through pellicle measurement

Indexed keywords

ADVANCED RETICLES; DOUBLE PATTERNING; IN-DIE REGISTRATION MEASUREMENT; LMS IPRO4; MASK METROLOGY; REGISTRATION METROLOGY; THROUGH-PELLICLE MEASUREMENT;

DESIGN; DIES; LITHOGRAPHY; MEASUREMENTS; UNITS OF MEASUREMENT;

PHOTOMASKS;

EID: 77954414186     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.833203     Document Type: Conference Paper

References (4)

1. G. Hughes: Mask Metrology - Current and Future Challenges, http://www.eeel.nist.gov/812/conference/2009-presentations/Hughes.pdf, 2009
2. K-D. Roeth, F. Laske, H. Kinoshita, D. Kenmochi, K-H. Schmidt, D. Adam: In-Die Registration Metrology on Future Generation Reticles, Proceedings of SPIE Vol. 7272, 2009.
3. K-D Roeth, F Laske, M Heiden, D Adam, A Boesser, K Rinn, A Schepp, J Bender, In-Die Mask Registration Metrology for 32nm Node DPT, SPIE Vol. 7379, 2009
4. th EMLC 2009