Orientation-dependent ion beam sputtering at normal incidence conditions in FeSiAl alloy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 741-744

  Batič, Barbara Šetina ^a   Jenko, Monika ^a  

^a INSTITUTE OF METALS AND TECHNOLOGY   (Slovenia)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BACKSCATTERED DIFFRACTION TECHNIQUES; ETCH PITS; FE-SI-AL; FESIAL ALLOYS; ION-BEAM SPUTTERING; NORMAL INCIDENCE; POLYCRYSTALLINE;

CERIUM ALLOYS; ION BEAMS; SPUTTERING;

CRYSTAL ORIENTATION;

EID: 77954197799     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3360924     Document Type: Conference Paper

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