Orientation dependent sputter yield of aluminium

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 72-75

  Manova, D ^a   Schreck, M ^a   Mandl S ^a,b   Stritzker, B ^a   Rauschenbach, B ^b,c  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

^c UNIVERSITY OF LEIPZIG   (Germany)

Author keywords

Aluminium nitride; Electron backscatter pattern; Plasma immersion ion implantation; Sputtering; Surface orientation

Indexed keywords

BACKSCATTERING; DIFFUSION; ION IMPLANTATION; SPUTTERING; SURFACE ROUGHNESS;

SPUTTER YIELD;

ALUMINUM;

ALUMINUM; ALUMINUM NITRIDE; ORIENTATION; SPUTTERING;

EID: 0036494912     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01595-X     Document Type: Article

References (14)