SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 4, 2010, Pages 505-509

Correlation of structure and hardness of rf magnetron sputtered silicon carbonitride films

(3) Bhattacharyya, A S a,b Mishra, S K a,b Mukherjee, S b

a NATIONAL METALLURGICAL LABORATORY (India)

b JADAVPUR UNIVERSITY (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER PRESSURE; CHEMICAL INERTNESS; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; FOURIER; FT-IR STUDY; FTIR; HARD PHASIS; INFRA RED; MATRIX; MICRO-STRUCTURAL; NANO-COMPOSITE COATING; NITROGEN PRESSURE; NUCLEATION AND GROWTH; OPTIMIZED CONDITIONS; RF MAGNETRONS; ROOM TEMPERATURE; SILICON CARBO-NITRIDE; SILICON CARBONITRIDE FILMS; STRUCTURAL CHARACTERIZATION; SUBSTRATE TEMPERATURE; SURFACE SMOOTHENING; SYSTEMATIC INVESTIGATIONS; TERNARY NANOCOMPOSITES; TUNABLE BAND-GAP; YOUNG'S MODULUS;

ARGON; CARBON NITRIDE; FIELD EMISSION; HARDNESS; INORGANIC COATINGS; MAGNETRONS; MECHANICAL PROPERTIES; NANOCOMPOSITES; NANOINDENTATION; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SILICON NITRIDE; SILICON OXIDES; SPRAYED COATINGS; TRANSMISSION ELECTRON MICROSCOPY; WEAR RESISTANCE;

CERAMIC COATINGS;

EID: 77954191144 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.3420430 Document Type: Conference Paper

Times cited : (25)

References (25)

1
- 0032302150
- JACTAW 0002-7820,. 10.1111/j.1151-2916.1998.tb02780.x
- R. Riedel, L. M. Ruswisch, L. An, and R. Raj, J. Am. Ceram. Soc. JACTAW 0002-7820 81, 3341 (1998). 10.1111/j.1151-2916.1998.tb02780.x
- (1998) J. Am. Ceram. Soc. , vol.81 , pp. 3341
- Riedel, R.¹ Ruswisch, L.M.² An, L.³ Raj, R.⁴

2
- 0032289026
- JACTAW 0002-7820,. 10.1111/j.1151-2916.1998.tb02775.x
- L. An, R. Riedel, C. Konetschny, H. Kleebe, and R. Raj, J. Am. Ceram. Soc. JACTAW 0002-7820 81, 3321 (1998). 10.1111/j.1151-2916.1998.tb02775.x
- (1998) J. Am. Ceram. Soc. , vol.81 , pp. 3321
- An, L.¹ Riedel, R.² Konetschny, C.³ Kleebe, H.⁴ Raj, R.⁵

3
- 0029637640
- NATUAS 0028-0836,. 10.1038/374526a0
- R. Riedel, H. J. Kleebe, H. Schoenfelder, and F. Aldinger, Nature (London) NATUAS 0028-0836 374, 526 (1995). 10.1038/374526a0
- (1995) Nature (London) , vol.374 , pp. 526
- Riedel, R.¹ Kleebe, H.J.² Schoenfelder, H.³ Aldinger, F.⁴

4
- 0032028320
- PSSABA 0031-8965,. 10.1002/(SICI)1521-396X(199803)166:1<269::AID- PSSA269>3.0.CO;2-7
- J. Bill, J. Seitz, G. Thurn, J. Durr, J. Canel, B. Z. Janos, A. Jalomecki, D. Santez, S. Schempp, H. P. Lamparter, J. Mayer, and F. Aldinger, Phys. Status Solidi A PSSABA 0031-8965 166, 269 (1998). 10.1002/(SICI)1521- 396X(199803)166:1<269::AID-PSSA269>3.0.CO;2-7
- (1998) Phys. Status Solidi A , vol.166 , pp. 269
- Bill, J.¹ Seitz, J.² Thurn, G.³ Durr, J.⁴ Canel, J.⁵ Janos, B.Z.⁶ Jalomecki, A.⁷ Santez, D.⁸ Schempp, S.⁹ Lamparter, H.P.¹⁰ Mayer, J.¹¹ Aldinger, F.¹²

5
- 0036343315
- JACTAW 0002-7820.
- A. Badzian, J. Am. Ceram. Soc. JACTAW 0002-7820 85, 16 (2002).
- (2002) J. Am. Ceram. Soc. , vol.85 , pp. 16
- Badzian, A.¹

6
- 33745494849
- Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques
- DOI 10.1016/j.jnoncrysol.2006.02.025, PII S0022309306003371
- I. Ferreira, E. Fortunato, P. Vilarinho, A. S. Viana, A. R. Ramos, E. Alves, and R. Martins, J. Non-Cryst. Solids JNCSBJ 0022-3093 352, 1361 (2006). 10.1016/j.jnoncrysol.2006.02.025 (Pubitemid 43959821)
- (2006) Journal of Non-Crystalline Solids , vol.352 , Issue.9-20 SPEC. ISS. , pp. 1361-1366
- Ferreira, I.¹ Fortunato, E.² Vilarinho, P.³ Viana, A.S.⁴ Ramos, A.R.⁵ Alves, E.⁶ Martins, R.⁷

7
- 33747394735
- Preparation of silicon carbide nitride films on Si substrate by pulsed high-energy density plasma
- DOI 10.1016/S1005-8850(06)60057-1
- X. Li, S. Yang, and X. Wu, J. Univ. Sci. Technol. Beijing 13, 272 (2006). 10.1016/S1005-8850(06)60057-1 1005-8850 (Pubitemid 44248965)
- (2006) Journal of University of Science and Technology Beijing: Mineral Metallurgy Materials (Eng Ed) , vol.13 , Issue.3 , pp. 272-276
- Li, X.¹ Yang, S.² Wu, X.³

8
- 33646181976
- ECCMF9 1388-2481,. 10.1016/j.elecom.2006.03.005
- X. B. Yan, B. K. Tay, G. Chen, and S. R. Yang, Electrochem. Commun. ECCMF9 1388-2481 8, 737 (2006). 10.1016/j.elecom.2006.03.005
- (2006) Electrochem. Commun. , vol.8 , pp. 737
- Yan, X.B.¹ Tay, B.K.² Chen, G.³ Yang, S.R.⁴

9
- 32644454148
- Deposition of SiCN films using organic liquid materials by HWCVD method
- DOI 10.1016/j.tsf.2005.07.210, PII S0040609005010345, Proceedings of the Third International Conference on Hot-Wire
- A. Izumi and K. Oda, Thin Solid Films THSFAP 0040-6090 501, 195 (2006). 10.1016/j.tsf.2005.07.210 (Pubitemid 43243011)
- (2006) Thin Solid Films , vol.501 , Issue.1-2 , pp. 195-197
- Izumi, A.¹ Oda, K.²

10
- 33645829619
- WEARCJ 0043-1648,. 10.1016/j.wear.2005.04.031
- D. Klaffke, R. Wasche, N. Janakiraman, and F. Aldinger, Wear WEARCJ 0043-1648 260, 711 (2006). 10.1016/j.wear.2005.04.031
- (2006) Wear , vol.260 , pp. 711
- Klaffke, D.¹ Wasche, R.² Janakiraman, N.³ Aldinger, F.⁴

11
- 33847139087
- Effect of pressure and substrate temperature on the deposition of nano-structured silicon-carbon-nitride superhard coatings by magnetron sputtering
- DOI 10.1016/j.tsf.2006.11.167, PII S0040609006014404
- S. K. Mishra, C. Shekhar, P. K. P. Rupa, and L. C. Pathak, Thin Solid Films THSFAP 0040-6090 515, 4738 (2007). 10.1016/j.tsf.2006.11.167 (Pubitemid 46282026)
- (2007) Thin Solid Films , vol.515 , Issue.11 , pp. 4738-4744
- Mishra, S.K.¹ Shekhar, C.² Rupa, P.K.P.³ Pathak, L.C.⁴

12
- 33744822751
- Deposition of nanostructured Si-C-N superhard coatings by rf magnetron sputtering
- DOI 10.1116/1.2200377
- S. K. Mishra, H. Gaur, P. K. P. Rupa, and L. C. Pathak, J. Vac. Sci. Technol. B JVTBD9 1071-1023 24, 1311 (2006). 10.1116/1.2200377 (Pubitemid 43838782)
- (2006) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.24 , Issue.3 , pp. 1311-1317
- Mishra, S.K.¹ Gaur, H.² Rupa, P.K.P.³ Pathak, L.C.⁴

13
- 77954205978
- Nanoindentation XP User's Manual (MTS System Corporation, USA.
- Nanoindentation XP User's Manual (MTS System Corporation, USA, 2001.
- (2001)

14
- 0026875935
- JMREEE 0884-2914,. 10.1557/JMR.1992.1564
- W. C. Oliver and G. M. Pharr, J. Mater. Res. JMREEE 0884-2914 7, 1564 (1992). 10.1557/JMR.1992.1564
- (1992) J. Mater. Res. , vol.7 , pp. 1564
- Oliver, W.C.¹ Pharr, G.M.²

15
- 29044433258
- Nanoindentation of coatings
- DOI 10.1088/0022-3727/38/24/R01, PII S0022372705817607
- S. J. Bull, J. Phys. D: Appl. Phys. JPAPBE 0022-3727 38, R393 (2005). 10.1088/0022-3727/38/24/R01 (Pubitemid 41788269)
- (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.24
- Bull, S.J.¹

16
- 33645241487
- THSFAP 0040-6090,. 10.1016/j.tsf.2005.08.075
- V. M. Ng, M. Xu, S. Y. Huang, J. D. Long, and S. Xu, Thin Solid Films THSFAP 0040-6090 506-507, 283 (2006). 10.1016/j.tsf.2005.08.075
- (2006) Thin Solid Films , vol.506-507 , pp. 283
- Ng, V.M.¹ Xu, M.² Huang, S.Y.³ Long, J.D.⁴ Xu, S.⁵

17
- 2942622300
- THSFAP 0040-6090,. 10.1016/j.tsf.2004.01.055
- Y. H. Wang, M. R. Moitreyee, R. Kumar, L. Shen, K. Y. Zeng, J. W. Chai, and J. S. Pan, Thin Solid Films THSFAP 0040-6090 460, 211 (2004). 10.1016/j.tsf.2004.01.055
- (2004) Thin Solid Films , vol.460 , pp. 211
- Wang, Y.H.¹ Moitreyee, M.R.² Kumar, R.³ Shen, L.⁴ Zeng, K.Y.⁵ Chai, J.W.⁶ Pan, J.S.⁷

18
- 67651017514
- VACUAV 0042-207X,. 10.1016/j.vacuum.2009.06.051
- A. S. Bhattacharya, G. C. Das, S. Mukherjee, and S. K. Mishra, Vacuum VACUAV 0042-207X 83, 1464 (2009). 10.1016/j.vacuum.2009.06.051
- (2009) Vacuum , vol.83 , pp. 1464
- Bhattacharya, A.S.¹ Das, G.C.² Mukherjee, S.³ Mishra, S.K.⁴

19
- 62549127285
- 0042-207X
- A. S. Bhattacharyya, S. K. Mishra, S. Mukherjee, and G. C. Das, Euro. Coat. J. 3, 108 (2009). 0042-207X
- (2009) Euro. Coat. J. , vol.3 , pp. 108
- Bhattacharyya, A.S.¹ Mishra, S.K.² Mukherjee, S.³ Das, G.C.⁴

20
- 77954191576
- JRSPAF 0377-0486 (to be published).
- A. S. Bhattacharyya and S. K. Mishra, J. Raman Spectrosc. JRSPAF 0377-0486 (to be published).
- J. Raman Spectrosc.
- Bhattacharyya, A.S.¹ Mishra, S.K.²

21
- 0001510029
- DRMTE3 0925-9635,. 10.1016/0925-9635(95)00363-0
- S. Prawer, K. W. Nugent, Y. Lifshitz G. D. Lempert, E. Grossman, J. Kulik, I. Avigal, and R. Kalish, Diamond Relat. Mater. DRMTE3 0925-9635 5, 433 (1996). 10.1016/0925-9635(95)00363-0
- (1996) Diamond Relat. Mater. , vol.5 , pp. 433
- Prawer, S.¹ Nugent, K.W.² Lifshitz, Y.³ Lempert, G.D.⁴ Grossman, E.⁵ Kulik, J.⁶ Avigal, I.⁷ Kalish, R.⁸

22
- 10044272974
- THSFAP 0040-6090,. 10.1016/j.tsf.2004.09.002
- E. J. Liang, J. W. Zhang, J. Leme, C. Moura, and L. Cunha, Thin Solid Films THSFAP 0040-6090 469-470, 410 (2004). 10.1016/j.tsf.2004.09.002
- (2004) Thin Solid Films , vol.469-470 , pp. 410
- Liang, E.J.¹ Zhang, J.W.² Leme, J.³ Moura, C.⁴ Cunha, L.⁵

23
- 0242603790
- PRBMDO 0163-1829,. 10.1103/PhysRevB.61.14095
- A. C. Ferrari and J. Robertson, Phys. Rev. B PRBMDO 0163-1829 61, 14095 (2000). 10.1103/PhysRevB.61.14095
- (2000) Phys. Rev. B , vol.61 , pp. 14095
- Ferrari, A.C.¹ Robertson, J.²

24
- 0038208253
- PRBMDO 0163-1829,. 10.1103/PhysRevB.67.155306
- A. C. Ferrari, S. E. Rodil, and J. Robertson, Phys. Rev. B PRBMDO 0163-1829 67, 155306 (2003). 10.1103/PhysRevB.67.155306
- (2003) Phys. Rev. B , vol.67 , pp. 155306
- Ferrari, A.C.¹ Rodil, S.E.² Robertson, J.³

25
- 33746031459
- BJPHE6 0103-9733,. 10.1590/S0103-97332006000300062
- A. Champi and F. C. Marques, Braz. J. Phys. BJPHE6 0103-9733 36, 462 (2006). 10.1590/S0103-97332006000300062
- (2006) Braz. J. Phys. , vol.36 , pp. 462
- Champi, A.¹ Marques, F.C.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.