Depth profiling of nanometer coatings by low temperature plasma probe combined with inductively coupled plasma mass spectrometry

Analytical Chemistry

Volumn 82, Issue 13, 2010, Pages 5872-5877

  Xing, Zhi ^a   Wang, Juan ^a   Han, Guojun ^a   Kuermaiti, Biekesailike ^a   Zhang, Sichun ^a   Zhang, Xinrong ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL PARTICLES; AMBIENT CONDITIONS; CARRIER GAS FLOW; CHARACTERIZATION METHODS; DEPTH-PROFILE ANALYSIS; ELECTRON COMPONENT; ELEMENTAL ANALYSIS; HIGH SENSITIVITY; HIGH SPATIAL RESOLUTION; LATERAL RESOLUTION; LOW LIMITS OF DETECTIONS; LOW TEMPERATURE PLASMAS; MASS REMOVAL; MATERIAL SCIENCE; MULTIPLE LAYERS; QUARTZ CAPILLARY; SCANNING ELECTRON MICROSCOPES; SILICON SUBSTRATES; SINGLE LAYER; SOLID SAMPLE ANALYSIS; THIN LAYER COATINGS; THIN LAYERS;

ATMOSPHERIC AEROSOLS; CHROMIUM; COATINGS; ELECTRIC DISCHARGES; ELECTROMAGNETIC INDUCTION; IMAGE RESOLUTION; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; IONIZATION OF GASES; MASS SPECTROMETERS; OXIDE MINERALS; PLASMA DIAGNOSTICS; PROBES; QUARTZ; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON COMPOUNDS; SILICON OXIDES; SPECTROMETRY; THIN FILMS;

DEPTH PROFILING;

EID: 77954187350     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac101147t     Document Type: Article

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