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Volumn 96, Issue 24, 2010, Pages

The origin of low water vapor transmission rates through Al2 O3 / ZrO2 nanolaminate gas-diffusion barriers grown by atomic layer deposition

(5) Meyer, J a Schmidt, H b Kowalsky, W b Riedl, T c Kahn, A a

a Princeton University (United States)

b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG (Germany)

c UNIVERSITY OF WUPPERTAL (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANTI-CORROSION; GAS DIFFUSION; LOW TEMPERATURES; LOW WATER; NANO-LAMINATES; NANOLAMINATE; ORGANIC ELECTRONICS; RELATIVE HUMIDITIES; SUB-LAYERS; THIN LAYERS; WATER VAPOR TRANSMISSION RATE; X RAY PHOTOEMISSION SPECTROSCOPY;

ALUMINUM; ATMOSPHERIC HUMIDITY; ATOMIC LAYER DEPOSITION; DIFFUSION BARRIERS; EMISSION SPECTROSCOPY; FILM GROWTH; PHASE INTERFACES; THIN FILMS; WATER VAPOR; ZIRCONIUM ALLOYS;

GAS PERMEABLE MEMBRANES;

EID: 77953730270 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3455324 Document Type: Article

Times cited : (111)

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