Aerial image improvements on the Intel MET

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Caudillo, Roman ^a   Younkin, Todd ^a   Putna, Steve ^a   Myers, Alan ^a   Shroff, Yashesh ^a   Bacuita, Terence ^a   Kloster, Grant ^a   Sohmen, Erik ^b  

^a INTEL CORPORATION   (United States)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

Aerial Image; EUV; EUVL; Extreme Ultraviolet Lithography; MET; Micro Exposure Tool

Indexed keywords

45-NM HALF-PITCH; AERIAL IMAGE; AERIAL IMAGES; DEPTH OF FOCUS; DIPOLE ILLUMINATION; EUV MASK; EXTREME ULTRAVIOLETS; MICRO-EXPOSURE TOOL; OUTER SHELLS; PARTIAL COHERENCE; PROCESS WINDOW; RESOLUTION CAPABILITY;

EXTREME ULTRAVIOLET LITHOGRAPHY; INSTALLATION; MASKS; PRINTING;

EXPOSURE METERS;

EID: 77953464485     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.849142     Document Type: Conference Paper

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