Monitoring reticle molecular contamination in ASML EUV alpha demo tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7636, Issue , 2010, Pages

  Okoroanyanwu, Uzodinma ^a   Jiang, Aiqin ^b   Dittmar, Kornelia ^c   Fahr, Torsten ^c   Laursen, Thomas ^b   Wood, Obert ^a   Cummings, Kevin ^b   Holfeld, Christian ^c   Peters, Jan Hendrik ^d   Gullikson, Eric ^e   La Fontaine, Bruno ^a  

^a IBM MICROELECTRONICS   (United States)

^b ASML US Inc   (United States)

^c GLOBALFOUNDRIES   (Germany)

^d AMTC   (Germany)

^e LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

carbon film deposition; EUV reticle molecular contamination; lifetime; surface oxidation

Indexed keywords

13.5 NM; ADVANCED LIGHT SOURCE; ANALYTICAL TECHNIQUES; EMPIRICAL RESULTS; EUV LITHOGRAPHY; EUV RADIATION; EXPOSURE CHAMBERS; EXPOSURE TOOL; FTIR; GRAZING INCIDENCE; MICRO-EXPOSURE TOOL; MITIGATION SCHEMES; MOLECULAR CONTAMINANTS; MOLECULAR CONTAMINATION; NEW YORK; REFLECTOMETRY; RUN COUNTERS; SURFACE OXIDATION; SURFACE OXIDATIONS; SURFACE OXIDE; VOLUME MANUFACTURING;

AUGER ELECTRON SPECTROSCOPY; CARBON FILMS; CONTAMINATION; EXPOSURE METERS; EXTREME ULTRAVIOLET LITHOGRAPHY; FOURIER TRANSFORMS; IMAGING TECHNIQUES; LIGHT SOURCES; LITHOGRAPHY; OXIDATION; REFLECTION; SCANNING ELECTRON MICROSCOPY; WAVELET TRANSFORMS;

OPTICAL INSTRUMENTS;

EID: 77953408325     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.847267     Document Type: Conference Paper

References (18)

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