Carbon contamination of EUV mask: Film characterization, impact on lithographic performance, and cleaning

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Nishiyama, Yasushi ^a   Anazawa, Toshihisa ^a   Oizumi, Hiroaki ^a   Nishiyama, Iwao ^a   Suga, Osamu ^a   Abe, Kazuki ^b   Kagata, Satoru ^b   Izumi, Akira ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cleaning; Contamination; EUV; Mask

Indexed keywords

ABSORBER PATTERN; ATOMIC HYDROGEN; CARBON CONTAMINATION; CARBON DEPOSITION; CD VARIATION; CLEANING EFFICIENCY; CLEANING PROCESS; DEPOSITION CHARACTERISTICS; DEPOSITION PROFILES; EUV; EUV MASK; FILM CHARACTERIZATIONS; FILM MATERIALS; X-RAY REFLECTIVITY MEASUREMENTS;

CARBON FILMS; PHOTOMASKS;

CLEANING;

EID: 79959328072     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772412     Document Type: Conference Paper

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