Cathode ray tube type electron gun as a source for multibeam electron lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2245-2249

  Van Den Brom, A J ^a   Van Veen, A H V ^a   Weeda, W M ^a   Berglund, G Z M ^a   Wieland, M ^a   Kruit, P ^b  

^a MAPPER Lithography BV   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODE RAY TUBES; CURRENT DENSITY; ELECTRIC SPACE CHARGE; ELECTRON BEAM LITHOGRAPHY; INVARIANCE; LUMINANCE;

DEPRESSIONS; DISPENSER CATHODES; HIGH BEAM CURRENTS;

ELECTRON GUNS;

EID: 37149001849     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2801869     Document Type: Article

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