Fabrication and characterization of p-type silicon field-emitter arrays for lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 2, 2005, Pages 359-369

  Teepen, T F ^a   Van Veen, A H V ^a   Van't Spijker, H ^a   Steenbrink, S W H K ^a   Van Zuuk, A ^a   Heerkens, C Th H ^a   Wieland, M J ^a   Van Druten, N J ^b,c   Kruit, P ^b  

^a MAPPER Lithography BV   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c UNIVERSITY OF AMSTERDAM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONS; SEMICONDUCTOR JUNCTIONS; SILICON; SINGLE CRYSTALS; WSI CIRCUITS;

CURRENT VOLTAGE CURVES; EMITTER ARRAYS; SI WAFERS;

ELECTRON BEAM LITHOGRAPHY;

EID: 31144432850     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1861045     Document Type: Conference Paper

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