SCOPUS 정보 검색 플랫폼

Volumn 7488, Issue , 2009, Pages

Inspection of 32nm imprinted patterns with an advanced e-beam inspection system

Author keywords

32nm; EBI; J FIL; NIL; Program defects; Repeating defects

Indexed keywords

32NM; EBI; J-FIL; NIL; PROGRAM DEFECTS; REPEATING DEFECTS;

DEFECTS; ELECTRON BEAMS; PHOTOMASKS;

INSPECTION;

EID: 77953298044 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.833419 Document Type: Conference Paper

Times cited : (12)

References (9)

2
- 0032625408
- M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE, Emerging Lithographic Technologies III, 379 (1999).
- (1999) Proc. SPIE, Emerging Lithographic Technologies , vol.3 , pp. 379
- Colburn, M.¹ Johnson, S.² Stewart, M.³ Damle, S.⁴ Bailey, T.⁵ Choi, B.⁶ Wedlake, M.⁷ Michaelson, T.⁸ Sreenivasan, S.V.⁹ Ekerdt, J.¹⁰ Willson, C.G.¹¹

3
- 67149124052
- Kosta Selinidis, Ecron Thompson, Ian McMackin, S.V. Sreenivasan, Douglas J. Resnick, Proc. SPIE Advance Lithography, 7271-66 (2009)
- (2009) Proc. SPIE Advance Lithography , vol.7271 , Issue.66
- Selinidis, K.¹ Thompson, E.² McMackin, I.³ Sreenivasan, S.V.⁴ Resnick, D.J.⁵

4
- 13244251409
- X. Liu, et al., J. Vac. Sci. Tech. B, 22, pp.3534-3538, 2004.
- (2004) J. Vac. Sci. Tech. B , vol.22 , pp. 3534-3538
- Liu, X.¹

5
- 28744433896
- Post-WCMP leakage detection and monitoring on 65-nm devices using an advanced e-beam inspection system
- Kirin Wang, Hermes Liu, J. H. Yeh, Mingsheng Tsai, Wei-Yih Wu, Hong-Chi Wu, Hong Xiao and Jack Jau, "Post-WCMP Leakage Detection and Monitoring on 65-nm Devices Using an Advanced e-beam Inspection System", Proc. of IEEE International Symposium of Semiconductor Manufacturing, pp. 472, (2005)
- (2005) Proc. of IEEE International Symposium of Semiconductor Manufacturing , pp. 472
- Wang, K.¹ Liu, H.² Yeh, J.H.³ Tsai, M.⁴ Wu, W.-Y.⁵ Wu, H.-C.⁶ Xiao, H.⁷ Jau, J.⁸

6
- 35148852072
- Contact leakage and open monitoring with an advanced E-beam inspection system
- Shuen-chen Lei, Hermes Liu, Mingsheng Tsai, Hung-Chi Wu, Hong Xiao and Jack Jau, "Contact leakage and open monitoring with an advanced e-beam inspection system", Proc. of SPIE, Vol. 6518, pp. 65184I, (2007)
- (2007) Proc. of SPIE , vol.6518
- Lei, S.-C.¹ Liu, H.² Tsai, M.³ Wu, H.-C.⁴ Xiao, H.⁵ Jau, J.⁶

7
- 34748835987
- Mechanism and application of negative charging mode of electron beam inspection for PMOS leakage detection
- Li-Lung Lai, Keren Xu, Daniel Deng, Jay Ning, Hong Xiao, Yan Zhao, Eric Ma, and Jack Jau, "Mechanism and Application of Negative Charging Mode of Electron Beam Inspection for PMOS Leakage Detection", Proc. of IEEE International Interconnect Technology Conf., pp. 111, (2007)
- (2007) Proc. of IEEE International Interconnect Technology Conf. , pp. 111
- Lai, L.-L.¹ Xu, K.² Deng, D.³ Ning, J.⁴ Xiao, H.⁵ Zhao, Y.⁶ Ma, E.⁷ Jau, J.⁸

8
- 66649123135
- Study of devices leakage of 45nm node with different SRAM layouts using an advanced ebeam inspection systems
- Hong Xiao, Long (Eric) Ma, Fei Wang, Yan Zhao, and Jack Jau, "Study of Devices Leakage of 45nm node with Different SRAM Layouts Using an Advanced ebeam Inspection Systems", Proc. of SPIE, Vol. 7272-55, (2009).
- (2009) Proc. of SPIE , vol.7272 , Issue.55
- Xiao, H.¹ Ma, L.² Wang, F.³ Zhao, Y.⁴ Jau, J.⁵

9
- 33745633317
- 65 nm photolithography process window qualification study with advanced e-beam metrology and inspection systems
- Ruei Hung Hsu, Benjamin Szu-Min Lin, Wei-Yih Wu, Hong Xiao, and Jack Jau, "65 nm Photolithography Process Window Qualification Study with Advanced e-beam Metrology and Inspection Systems", Proc. of SPIE, Vol. 6125, pp. 61254K, (2006)
- (2006) Proc. of SPIE , vol.6125
- Hsu, R.H.¹ Lin, B.S.-M.² Wu, W.-Y.³ Xiao, H.⁴ Jau, J.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.