-
1
-
-
73849102215
-
-
E. Kasper and K. Lyutovich, Editors, INSPEC, London, UK
-
F. Schaffler, in Properties of Silicon Germanium and SiGe:Carbon, E. Kasper, and, K. Lyutovich, Editors, p. 198, INSPEC, London, UK (2000).
-
(2000)
Properties of Silicon Germanium and SiGe:Carbon
, pp. 198
-
-
Schaffler, F.1
-
2
-
-
33750712063
-
Temperature dependent metal-induced lateral crystallization of amorphous SiGe on insulating substrate
-
DOI 10.1063/1.2374849
-
H. Kanno, K. Toko, T. Sadoh, and M. Miyao, Appl. Phys. Lett. , 89, 182120 (2006). 10.1063/1.2374849 (Pubitemid 44705710)
-
(2006)
Applied Physics Letters
, vol.89
, Issue.18
, pp. 182120
-
-
Kanno, H.1
Toko, K.2
Sadoh, T.3
Miyao, M.4
-
3
-
-
0004720666
-
-
JNCSBJ 0022-3093,. 10.1016/0022-3093(72)90114-7
-
. Barna, P. B. Barna, and J. F. Pócza, J. Non-Cryst. Solids JNCSBJ 0022-3093, 8-10, 36 (1972). 10.1016/0022-3093(72)90114-7
-
(1972)
J. Non-Cryst. Solids
, vol.8-10
, pp. 36
-
-
Barna, .1
Barna, P.B.2
Pócza, J.F.3
-
4
-
-
33646537829
-
-
JVTAD6 0734-2101,. 10.1116/1.2191861
-
S. Gaudet, C. Detavernier, A. J. Kellock, P. Desjardins, and C. Lavoie, J. Vac. Sci. Technol. A JVTAD6 0734-2101, 24, 474 (2006). 10.1116/1.2191861
-
(2006)
J. Vac. Sci. Technol. A
, vol.24
, pp. 474
-
-
Gaudet, S.1
Detavernier, C.2
Kellock, A.J.3
Desjardins, P.4
Lavoie, C.5
-
5
-
-
13744251847
-
Low-temperature copper-induced lateral growth of polycrystalline germanium assisted by external compressive stress
-
DOI 10.1063/1.1836012, 044901
-
B. Hekmatshoar, S. Mohajerzadeh, D. Shahrjerdi, A. Afzali-Kusha, M. D. Robertson, and A. Tonita, J. Appl. Phys. , 97, 044901 (2005). 10.1063/1.1836012 (Pubitemid 40238322)
-
(2005)
Journal of Applied Physics
, vol.97
, Issue.4
, pp. 0449011-0449015
-
-
Hekmatshoar, B.1
Mohajerzadeh, S.2
Shahrjerdi, D.3
Afzali-Kusha, A.4
Robertson, M.D.5
Tonita, A.6
-
6
-
-
18844367237
-
Low-temperature Al-induced crystallization of amorphous Ge
-
DOI 10.1063/1.1889227, 094914
-
A. R. Zanatta and I. Chambouleyron, J. Appl. Phys. , 97, 094914 (2005). 10.1063/1.1889227 (Pubitemid 40690713)
-
(2005)
Journal of Applied Physics
, vol.97
, Issue.9
, pp. 1-11
-
-
Zanatta, A.R.1
Chambouleyron, I.2
-
7
-
-
21244502538
-
2 by Au-mediated lateral crystallization
-
DOI 10.1143/JJAP.44.2405, Solid State Devices and Materials
-
H. Kanno, T. Aoki, A. Kenjo, T. Sadoh, and M. Miyao, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922, 44, 2405 (2005). 10.1143/JJAP.44.2405 (Pubitemid 40892690)
-
(2005)
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
, vol.44
, Issue.4 B
, pp. 2405-2408
-
-
Kanno, H.1
Aoki, T.2
Kenjo, A.3
Sadoh, T.4
Miyao, M.5
-
8
-
-
56249092758
-
-
10.1063/1.3025849
-
J. -H. Park, D. Kuzum, M. Tada, and K. C. Saraswat, Appl. Phys. Lett. , 93, 193507 (2008). 10.1063/1.3025849
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 193507
-
-
Park, J.-H.1
Kuzum, D.2
Tada, M.3
Saraswat, K.C.4
-
9
-
-
69149104279
-
-
10.1149/1.3126496
-
R. Xie, T. H. Phung, M. Yu, S. A. Oh, S. Tripathy, and C. Zhu, Electrochem. Solid-State Lett. , 12, H266 (2009). 10.1149/1.3126496
-
(2009)
Electrochem. Solid-State Lett.
, vol.12
-
-
Xie, R.1
Phung, T.H.2
Yu, M.3
Oh, S.A.4
Tripathy, S.5
Zhu, C.6
-
10
-
-
65449123777
-
-
10.1063/1.3110722
-
W. Knaepen, S. Gaudet, C. Detavernier, R. L. Van Meirhaeghe, J. J. Sweet, and C. Lavoie, J. Appl. Phys. , 105, 083532 (2009). 10.1063/1.3110722
-
(2009)
J. Appl. Phys.
, vol.105
, pp. 083532
-
-
Knaepen, W.1
Gaudet, S.2
Detavernier, C.3
Van Meirhaeghe, R.L.4
Sweet, J.J.5
Lavoie, C.6
-
11
-
-
2442433444
-
Annealing behavior and solid-state reactions of Pd-Ge alloy thin films
-
DOI 10.1016/j.msea.2003.11.032, PII S0921509303014266
-
Z. Chen, S. Zhang, S. Tan, and Z. Wu, Mater. Sci. Eng., A , 373, 21 (2004). 10.1016/j.msea.2003.11.032 (Pubitemid 38641308)
-
(2004)
Materials Science and Engineering A
, vol.373
, Issue.1-2
, pp. 21-25
-
-
Chen, Z.1
Zhang, S.2
Tan, S.3
Wu, Z.4
-
12
-
-
0347601896
-
-
MIENEF 0167-9317,. 10.1016/j.mee.2003.11.001
-
P. Machác and V. Machovic, Microelectron. Eng. MIENEF 0167-9317, 71, 177 (2004). 10.1016/j.mee.2003.11.001
-
(2004)
Microelectron. Eng.
, vol.71
, pp. 177
-
-
MacHác, P.1
MacHovic, V.2
-
13
-
-
45149127557
-
-
10.1063/1.2924417
-
G. Kartopu, A. V. Sapelkin, V. A. Karavanskii, U. Serincan, and R. Turan, J. Appl. Phys. , 103, 113518 (2008). 10.1063/1.2924417
-
(2008)
J. Appl. Phys.
, vol.103
, pp. 113518
-
-
Kartopu, G.1
Sapelkin, A.V.2
Karavanskii, V.A.3
Serincan, U.4
Turan, R.5
-
14
-
-
36549104969
-
-
10.1063/1.99054
-
E. Bustarret, M. A. Hachicha, and M. Brunel, Appl. Phys. Lett. , 52, 1675 (1988). 10.1063/1.99054
-
(1988)
Appl. Phys. Lett.
, vol.52
, pp. 1675
-
-
Bustarret, E.1
Hachicha, M.A.2
Brunel, M.3
-
15
-
-
0000172317
-
-
10.1063/1.93133
-
R. Tsu, J. Gonzalez-Hernandez, S. S. Chao, S. C. Lee, and K. Tanaka, Appl. Phys. Lett. , 40, 534 (1982). 10.1063/1.93133
-
(1982)
Appl. Phys. Lett.
, vol.40
, pp. 534
-
-
Tsu, R.1
Gonzalez-Hernandez, J.2
Chao, S.S.3
Lee, S.C.4
Tanaka, K.5
-
16
-
-
0019539913
-
-
10.1016/0040-6090(82)90590-9
-
D. E. Aspnes, Thin Solid Films , 89, 249 (1982). 10.1016/0040-6090(82) 90590-9
-
(1982)
Thin Solid Films
, vol.89
, pp. 249
-
-
Aspnes, D.E.1
|