Microwave ECR plasma CVD of cubic Y2O3 coatings and their characterization

Surface and Coatings Technology

Volumn 204, Issue 20, 2010, Pages 3167-3172

  Barve, S A ^a   Jagannath, ^a   Mithal, N ^a   Deo, M N ^a   Chand, N ^a   Bhanage, B M ^b   Gantayet, L M ^a   Patil, D S ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

^b UNIVERSITY OF MUMBAI   (India)

Author keywords

ECR; MOCVD; XPS; Y2O3

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DEPOSITED COATINGS; ECR PLASMA; GLANCING ANGLE X-RAY DIFFRACTIONS; LOW SUBSTRATE TEMPERATURE; MANUFACTURING PROCESS; METAL ORGANIC; METAL ORGANIC PRECURSORS; MICROWAVE ELECTRON CYCLOTRON RESONANCE; MOCVD; POROUS COATINGS; SINGLE PHASE; SUBSTRATE TEMPERATURE; ULTRASOUND METHODS; VARIOUS SUBSTRATES; XPS;

COATINGS; CYCLOTRONS; DEPOSITION; ELECTRON CYCLOTRON RESONANCE; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROWAVES; ORGANIC CHEMICALS; ORGANOMETALLICS; PLASMA DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; YTTRIUM; YTTRIUM OXIDE;

YTTRIUM ALLOYS;

EID: 77953024238     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.03.003     Document Type: Article

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